EBL is a high-resolution lithography technique that uses a focused electron beam to write patterns on an electron-sensitive resist. For CFL mold fabrication, EBL is used to create patterns with ...

High-NA EUV lithography makes it possible to form fine patterns on silicon wafers with a higher resolution than previously possible, and is expected to lead to the realization of high-performance ...

C-Nano is ideal for characterizing all types of samples, but its high pixel resolution makes it suitable for comprehensive strain analyses as well as for routine work on complex and challenging ...