Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Lawrence Beall-Smith (1909-1989) worked in various media, including painting, lithography, illustration, and sculpture. He studied at the Art Institute of Chicago and the University of Chicago, ...